Semiconductor Manufacturing Handbook

Semiconductor Manufacturing Handbook

by Hwaiyu Geng

NOOK Book(eBook)

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Overview

This handbook will provide engineers with the principles, applications, and solutions needed to design and manage semiconductor manufacturing operations. Consolidating the many complex fields of semiconductor fundamentals and manufacturing into one volume by deploying a team of world class specialists, it allows the quick look up of specific manufacturing reference data across many subdisciplines.

Product Details

ISBN-13: 9780071469654
Publisher: McGraw-Hill Education
Publication date: 05/18/2005
Sold by: Barnes & Noble
Format: NOOK Book
Pages: 800
File size: 25 MB
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About the Author

Hwaiyu Geng, CMfgE, P.E. (Palo Alto, California) is a Project Manager of Corporate REWS at Hewlett-Packard Company. His experience in manufacturing engineering is diverse, including work at Applied Materials and Hewlett-Packard’s high-tech industries. He has faced many of the challenges facing engineers today, having designed manufacturing processes and facilities for new products, implemented automated manufacturing systems, and established quality, safety, and maintenance programs. He is a Certified Manufacturing Engineer by the Society of Manufacturing Engineers and a Professional Engineer in the State of California. Mr. Geng is also the author of McGraw-Hill's Manufacturing Engineering Handbook.

Table of Contents

PART 1: Semiconductor Fundamentals and Basic Materials BOARD OF REVIEWERS CONTRIBUTORS PREFACE ACKNOWLEDGMENTS Chapter 1: How Semiconductor Chips Are Made - Hwaiyu Geng, Lin Zhou Chapter 2: IC Design - Ilsun Park Chapter 3: Silicon Substrates for Semiconductor Manufacturing - K.V. Ravi Chapter 4: Copper, Low-k Dielectrics, and Their Reliability - Hazara S. Rathore, Kaushik Chanda Chapter 5: Fundamentals-Silicide Formation on Si - L.P. Ren, King N. Tu Chapter 6: Plasma Process Control - David J. Coumou Chapter 7: Vacuum Technology - Peter Biltoft Chapter 8: Photomask - Charles Howard PART 2: Wafer Processing Chapter 9: Microlithography - Chris A. Mack Chapter 10: Ion Implantation and Rapid Thermal Processing - Michael Graf Chapter 11: Wet Etching - Peng Zhang Chapter 12: Plasma Etching - Shouliang Lai Chapter 13: Physical Vapor Deposition - Florian Solzbacher Chapter 14: Chemical Vapor Deposition - Edward J. McInerney Chapter 15: Epitaxy - Jamal Ramdani, Giovanni Vaccari Chapter 16: ECD Fundamentals - Tom Ritzdorf, John Klocks Chapter 17: Chemical Mechanical Planarization - Timothy S. Dyer Chapter 18: Wet Cleaning - Andrew Machamer Part 3: Final Manufacturing Chapter 19: Inspection, Measurement, and Test - Donald W. Blair Chapter 20: Grinding, Stress Relief, and Dicing - Kazuhisa Arai, Yoshikazu Kobayashi, Hideaki Otani Chapter 21: Packaging - Dietrich Tonnies, Michael Topper Part 4: Nanotechnology, MEMS, and FPD Chapter 22: Nanotechnology and Nanomanufacturing - Zhong L. Wang Chapter 23: Fundamentals of Microelectromechanical Systems - Michael A. Huff Chapter 24: Flat-Panel Display Technology and Manufacturing - David N. Liu Part 5: Gases and Chemicals Chapter 25: Specialty Gas and CDA Systems - Wayne D. Curcie Chapter 26: Waste Gas Abatement Systems - Joseph D. Sweeney Chapter 27: PFC Abatement - James C. Cox Chapter 28: Chemical and Slurry Handling Systems - Kristin Cavicchi, Dan Barsness Chapter 29: Fluid Handling Components for High Purity Liquid Chemicals and Slurries - Charles K. Gould Chapter 30: Fundamentals of Ultrapure Water - David J. Albrecht Part 6: Fab Yield, Operations, and Facilities Chapter 31: Yield Management - Bo Li, Wayne Carriker Chapter 32: Automated Material Handling System - Clint Harris Chapter 33: CD Metrology and CD-SEM - Ram Peltinov, Mina Menaker Chapter 34: Six Sigma - Bruno Scibilia, Yoan Dupret Chapter 35: Advanced Process Control - Robert H. McCafferty Chapter 36: Environmental, Health, and Safety (EHS) Considerations in Semiconductor Fabrication Facilities - Brett J. Davis, Steven R. Trammell Chapter 37: Plan, Design, and Construction of a FAB - Industrial Design and Construction Chapter 38: Cleanroom Design and Construction - Richard V. Pavlotsky, Stephen C. Beck Chapter 39: Micro-Vibration and Noise Design - Michael Gandreau, Hal Amick Chapter 40: ESD Controls in Cleanroom Environments - Larry Levit Chapter 41: Airborne Molecular Contamination - Chris Muller Chapter 42: Particle Monitoring in Semiconductor Manufacturing - Steven Kochevar, Jerry Gromala Chapter 43: Wastewater Neutralization Systems - Richard E. Pinkowski APPENDIX INDEX

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